Tokyo, Japan

Nobuyasu Horiuchi

This inventor holds 1 USPTO granted patent. Top assignees: Fujitsu Corporation, Japan Control Systems, Inc.. Active years: 1995.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Nobuyasu Horiuchi. Retrieved from https://idiyas.com/inventor/nobuyasu-horiuchi

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 6(Granted Patents)


Company Filing History:


Years Active: 1995

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1 patent (USPTO):Explore Patents

Title: Nobuyasu Horiuchi: Innovator in Integrated Circuit Production

Introduction

Nobuyasu Horiuchi is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of integrated circuit production through his innovative patent. His work has been instrumental in advancing technology in this area.

Latest Patents

Horiuchi holds a patent for a "Mask data processing apparatus for integrated circuit production." This apparatus is designed to transform a design data format from computer-aided design into mask data for actual integrated circuits. The apparatus features a data transformation unit that includes a control central processor unit and a picture processing processor, which monitors the transformation process.

Career Highlights

Throughout his career, Nobuyasu Horiuchi has worked with prominent companies such as Fujitsu Corporation and Japan Control Systems, Inc. His experience in these organizations has allowed him to refine his skills and contribute to significant advancements in technology.

Collaborations

Horiuchi has collaborated with notable coworkers, including Kenichi Kobayashi and Masahiro Yumoto. Their combined expertise has fostered innovation and development in their respective fields.

Conclusion

Nobuyasu Horiuchi's contributions to integrated circuit production through his patent and collaborations highlight his role as an influential inventor. His work continues to impact the technology landscape positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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