Hikone, Japan

Nobutoshi Ohgami

This inventor holds 1 USPTO granted patent. Top assignee: Dainippon Screen Mfg. Co., Ltd.. Active years: 1986.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Nobutoshi Ohgami. Retrieved from https://idiyas.com/inventor/nobutoshi-ohgami

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 40(Granted Patents)


Company Filing History:


Years Active: 1986

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1 patent (USPTO):Explore Patents

Title: Nobutoshi Ohgami: Innovator in Surface Treatment Technology

Introduction

Nobutoshi Ohgami is a prominent inventor based in Hikone, Japan. He is known for his innovative contributions to surface treatment technology. With a focus on enhancing manufacturing processes, Ohgami has made significant strides in his field.

Latest Patents

Ohgami holds a patent for a method of surface treatment. This method involves irradiating a part of a plate with light flux and detecting the quantity of transmitted or reflected light. The process includes determining the end point of surface treatment based on variations in the detected signal level. This innovative approach allows for precise control over the surface treatment process.

Career Highlights

Ohgami is associated with Dainippon Screen Mfg. Co., Ltd., a company renowned for its advancements in manufacturing technology. His work has contributed to the company's reputation as a leader in the industry. With 1 patent to his name, Ohgami continues to push the boundaries of what is possible in surface treatment.

Collaborations

Throughout his career, Ohgami has collaborated with notable colleagues, including Masaru Kitagawa and Masakazu Saita. These partnerships have fostered a creative environment that encourages innovation and the sharing of ideas.

Conclusion

Nobutoshi Ohgami's contributions to surface treatment technology exemplify the spirit of innovation. His work not only enhances manufacturing processes but also sets a standard for future advancements in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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