Nobuo Yoneyama

Title: Nobuo Yoneyama: Innovator in Magnetron Sputtering Technology

Introduction

Nobuo Yoneyama is a notable inventor based in Takarazuka, Japan. He has made significant contributions to the field of magnetron sputtering technology, which is essential in various applications, including semiconductor manufacturing and surface coating.

Latest Patents

Yoneyama holds a patent for a "Magnet structure and cathode electrode unit for magnetron sputtering, and magnetron sputtering system." This invention focuses on a magnet structure designed to reduce the labor required for creating a magnet design that produces a tunnel-shaped leakage magnetic field for plasma confinement. The design is based on a quadridirectional magnetic field generated by the interaction of multiple magnets. The patent outlines a configuration that includes inner and outer magnets, intermediate magnets, and a magnetic member, all working together to optimize the magnetic force lines for effective plasma confinement.

Career Highlights

Yoneyama is currently employed at Shinmaywa Industries, Ltd., where he continues to innovate in the field of magnetron sputtering. His work has been instrumental in advancing technologies that rely on precise magnetic field manipulation.

Collaborations

Throughout his career, Yoneyama has collaborated with talented individuals such as Takahiko Kondo and Takanobu Hori. These collaborations have contributed to the development of cutting-edge technologies in their field.

Conclusion

Nobuo Yoneyama's contributions to magnetron sputtering technology highlight his innovative spirit and dedication to advancing scientific knowledge. His patent reflects a significant step forward in the efficiency of plasma confinement systems.