Magnet structure and cathode electrode unit for magnetron sputtering, and magnetron sputtering system

Abstract

A magnet structure and the like are provided, which can reduce the labor required to make a magnet design for producing a tunnel-shaped leakage magnetic field for plasma confinement in a well-balanced manner over an obverse surface of a target, based on a quadridirectional magnetic field produced by magnetic interaction between plural magnets. The magnet structure () includes: inner and outer magnets (and) positioned at a reverse surface side of a target () to have different magnetic moment orientations for producing a first magnetic force line reaching an obverse surface (A) of the target (); a pair of intermediate magnets (and) positioned at the reverse surface side of the target () and between the inner and outer magnets (and) to have different magnetic moment orientations, for producing a second magnetic force line acting to cancel a widthwise magnetic flux density component which is produced by the first magnetic force line; and a magnetic member () positioned at the reverse surface side of the target () to guide the second magnetic force line emanating from an end surface of one of the pair of intermediate magnets (and) into an end surface of the other, the magnetic member () being configured to produce a magnetic force line reaching an intermediate point in a thickness direction of the target () in association with the inner magnet () or the outer magnet ().