San Francisco, CA, United States of America

Nobuo Otsuka

This inventor holds 1 USPTO granted patent. Top assignee: Basis Technology Corporation. Active years: 2010.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Nobuo Otsuka. Retrieved from https://idiyas.com/inventor/nobuo-otsuka-wibq4r3s

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 1.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2010

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1 patent (USPTO):Explore Patents

Title: Nobuo Otsuka: Innovator in Data Cleansing Technology

Introduction

Nobuo Otsuka is a prominent inventor based in San Francisco, CA. He has made significant contributions to the field of automated language identification through his innovative patent. His work focuses on improving the quality of training data used in machine learning applications.

Latest Patents

Nobuo Otsuka holds a patent for a "Data cleansing system and method." This automated system is designed for debugging training data utilized in training automated language identifiers. The system collects texts written in a specific language and generates an occurrence count for words in each text. It calculates the occurrence ratio of each word by dividing the occurrence count by the total number of words in the text. Words are filtered based on their occurrence ratios, resulting in a clean text that enhances the training process.

Career Highlights

Nobuo Otsuka is associated with Basis Technology Corporation, where he applies his expertise in data cleansing and language processing. His work has been instrumental in advancing the capabilities of automated systems in understanding and processing human languages.

Collaborations

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Conclusion

Nobuo Otsuka's innovative contributions to data cleansing technology have paved the way for more effective automated language identification systems. His patent reflects a commitment to enhancing the quality of training data, which is crucial for the advancement of machine learning applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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