Tokyo, Japan

Nobuo Oku

This inventor holds 1 USPTO granted patent. Top assignee: Jsw Aktina System Co., Ltd.. Active years: 2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Nobuo Oku. Retrieved from https://idiyas.com/inventor/nobuo-oku-sug8f66j

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2024

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1 patent (USPTO):Explore Patents

Title: Nobuo Oku - Innovator in Laser Annealing Technology

Introduction

Nobuo Oku is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of semiconductor manufacturing through his innovative technologies. His work primarily focuses on laser annealing methods, which are crucial for enhancing the performance of semiconductor devices.

Latest Patents

Nobuo Oku holds a patent for a "Laser annealing apparatus, laser annealing method, and method for manufacturing semiconductor device." This invention includes a laser light source, an annealing optical system, and a moving mechanism that adjusts the position of the irradiation region relative to the substrate. The apparatus is designed to improve the efficiency and effectiveness of the annealing process, which is vital for semiconductor fabrication.

Career Highlights

Throughout his career, Nobuo Oku has been associated with Jsw Aktina System Co., Ltd., where he has played a key role in developing advanced technologies for semiconductor manufacturing. His expertise in laser technology has positioned him as a valuable asset in the industry.

Collaborations

Nobuo has collaborated with notable colleagues, including Kenichi Ohmori and Suk-Hwan Chung. These partnerships have fostered innovation and have contributed to the advancement of laser annealing techniques.

Conclusion

Nobuo Oku's contributions to laser annealing technology have significantly impacted the semiconductor industry. His innovative approaches continue to pave the way for advancements in manufacturing processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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