Tokyo, Japan

Nobuo Nabeshima

This inventor holds 1 USPTO granted patent. Top assignee: Sony Magnescale Inc.. Active years: 1995.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Nobuo Nabeshima. Retrieved from https://idiyas.com/inventor/nobuo-nabeshima-w8xx6p5h

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 1.0

ph-index = 1

Forward Citations = 9(Granted Patents)


Company Filing History:


Years Active: 1995

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Nobuo Nabeshima: Innovator in Displacement Measurement Technology

Introduction

Nobuo Nabeshima is a distinguished inventor based in Tokyo, Japan. He is known for his innovative contributions to the field of displacement measurement technology. His work has significantly advanced the capabilities of measurement apparatuses, particularly in precision applications.

Latest Patents

Nabeshima holds a patent for a "Displacement measurement apparatus having first and second servo control." This invention utilizes an astigmatism to measure displacement accurately. The apparatus comprises an objective lens and an optical system that detects the offset distance between the lens and a measured surface. It generates a focus-error signal, which is crucial for maintaining the relative distance at the focal point. The system includes an actuator that moves the objective lens based on this signal, ensuring precise measurements.

Career Highlights

Nobuo Nabeshima is currently employed at Sony Magnescale Inc., where he continues to develop cutting-edge technologies. His expertise in optical systems and servo control circuits has made him a valuable asset to the company. His innovative approach has led to advancements in measurement accuracy and efficiency.

Conclusion

Nobuo Nabeshima's contributions to displacement measurement technology exemplify the impact of innovation in engineering. His patent reflects a commitment to precision and advancement in measurement systems. His work continues to influence the field and inspire future innovations.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…