Soka, Japan

Nobuo Ishii

This inventor holds 5 USPTO granted patents. Top assignee: Ishifuku Metal Industry Co., Ltd.. Active years: 2008-2015.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Nobuo Ishii. Retrieved from https://idiyas.com/inventor/nobuo-ishii-swcicfle

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 2.1

ph-index = 1


Company Filing History:


Years Active: 2008-2015

Loading Chart...
5 patents (USPTO):Explore Patents

Title: Nobuo Ishii: Innovator in Sputtering Target Materials

Introduction

Nobuo Ishii is a prominent inventor based in Soka, Japan. He has made significant contributions to the field of materials science, particularly in the development of sputtering target materials. With a total of 5 patents to his name, Ishii's work has had a notable impact on various industries.

Latest Patents

One of Ishii's latest inventions is a sputtering target material that provides high reflectance and excellent heat resistance. This innovative material is formed from silver (Ag) base alloys, which incorporate a specific, minor amount of phosphorus (P) to enhance their properties. This invention is crucial for applications requiring durable and efficient materials.

Career Highlights

Ishii is associated with Ishifuku Metal Industry Co., Ltd., where he continues to push the boundaries of material innovation. His expertise in alloying techniques has positioned him as a key figure in the development of advanced sputtering materials.

Collaborations

Throughout his career, Ishii has collaborated with notable professionals in the field, including Koichi Hasegawa and Tomoyoshi Asaki. These collaborations have further enriched his research and development efforts.

Conclusion

Nobuo Ishii's contributions to sputtering target materials exemplify his dedication to innovation in materials science. His work continues to influence the industry and pave the way for future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…