Company Filing History:
Years Active: 1981
Title: Nobuo Hamamto: Innovator in Mark Signal Amplification
Introduction
Nobuo Hamamto is a distinguished inventor based in Tokyo, Japan. He is known for his significant contributions to the field of electron-beam lithography. His innovative work focuses on enhancing the accuracy of mark detection on samples, which is crucial for various applications in technology and manufacturing.
Latest Patents
Nobuo Hamamto holds a patent for a mark signal amplifier. This invention addresses the need for high accuracy in detecting the position of a mark on a sample during electron-beam lithography. The patent describes a system that includes a first circuit to extract maximum and minimum values from a detected mark signal. A second circuit calculates the peak-to-peak value of the signal's amplitude based on these values. Finally, a third circuit generates a constant amplitude output signal for binary coding, ensuring consistent performance despite fluctuations in the detected signal. This innovation significantly improves the precision of mark detection for positioning.
Career Highlights
Nobuo Hamamto is associated with Hitachi, Ltd., a leading company in technology and innovation. His work at Hitachi has allowed him to develop and refine his inventions, contributing to advancements in the field of electron-beam lithography. His expertise and dedication have made him a valuable asset to the company.
Collaborations
Nobuo has collaborated with notable colleagues, including Shigeru Moriya and Kazuo Ichino. These partnerships have fostered a creative environment that encourages innovation and the sharing of ideas.
Conclusion
Nobuo Hamamto's contributions to mark signal amplification exemplify the importance of innovation in technology. His work not only enhances the accuracy of electron-beam lithography but also showcases the collaborative spirit within the field. His achievements continue to influence advancements in precision technology.