The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 27, 1981

Filed:

Dec. 26, 1979
Applicant:
Inventors:

Shigeru Moriya, Hoya, JP;

Nobuo Hamamto, Tokyo, JP;

Kazuo Ichino, Tokyo, JP;

Kanji Ozawa, Akishima, JP;

Assignee:

Hitachi, Ltd., Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06K / ;
U.S. Cl.
CPC ...
3401 / ; 307351 ; 3401 / ; 364490 ;
Abstract

In electron-beam lithography, and similar operations, to achieve good drawing accuracy on a sample, it is necessary to detect the position of a mark on the sample with high accuracy. To accomplish this, a mark signal amplifier is provided including a first circuit for taking maximum and minimum values out of a mark signal detected by causing an electron beam to scan a mark area provided on a sample. A second circuit determines a peak-to-peak value of an amplitude of the detected mark signal in accordance with the maximum and minimum values, and a third circuit produces an output signal of a constant amplitude level as an input to a binary-coding circuit in accordance with the peak-to-peak value. The output signal of the third circuit remains constant in spite of fluctuations of the detected mark signal, so that a higher accuracy is obtained in detecting the mark for positioning. An alternative arrangement adds the maximum and minimum values, and establishes a mean value of the maximum and minimum values from the resultant sum.


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