Ibaraki, Japan

Nobuo Fujieda


Average Co-Inventor Count = 6.5

ph-index = 1

Forward Citations = 36(Granted Patents)


Location History:

  • Ibaraki-ken, JP (1998)
  • Ibaraki, JP (2012)

Company Filing History:


Years Active: 1998-2012

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2 patents (USPTO):Explore Patents

Title: Nobuo Fujieda: Innovator in Semiconductor Technology

Introduction

Nobuo Fujieda is a prominent inventor based in Ibaraki, Japan. He has made significant contributions to the field of semiconductor technology, holding 2 patents that showcase his innovative approach to electronic devices.

Latest Patents

Fujieda's latest patents include a wiring board and a semiconductor device. The wiring board features a design with a plurality of trenches arranged in parallel on a substrate, which allows for the integration of electronic devices. This design not only enhances the fine wire pattern but also reduces costs associated with organic thin film electronic devices through advancements in printing techniques. His semiconductor device is tailored for use in inverter devices that require high reliability, particularly those utilizing IGBT chips. This device incorporates an insulating plate, semiconductor chips, and a resin case, which collectively improve heat transfer and eliminate the fatigue failure associated with traditional solder layers.

Career Highlights

Fujieda is currently employed at Hitachi, Ltd., where he continues to develop cutting-edge technologies in the semiconductor sector. His work has been instrumental in advancing the reliability and efficiency of electronic devices.

Collaborations

Fujieda has collaborated with notable colleagues such as Akio Yasukawa and Hirohisa Yamamura, contributing to a dynamic environment of innovation and research.

Conclusion

Nobuo Fujieda's contributions to semiconductor technology reflect his commitment to innovation and excellence. His patents not only enhance the functionality of electronic devices but also pave the way for future advancements in the field.

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