Tokyo, Japan

Nobuhiro Nagayama

This inventor holds 1 USPTO granted patent. Top assignee: Asahi Denka Kogyo Kabushiki Kaisha. Active years: 2002.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Nobuhiro Nagayama. Retrieved from https://idiyas.com/inventor/nobuhiro-nagayama

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2002

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1 patent (USPTO):Explore Patents

Title: Nobuhiro Nagayama: Innovator in Curable Compositions

Introduction

Nobuhiro Nagayama is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of curable compositions, showcasing his expertise through innovative patents. His work is particularly recognized for its application in various industrial processes.

Latest Patents

Nagayama holds a patent for a curable composition that includes a bisepoxy compound and a polyepoxy compound with a polyhydric phenol skeleton. The specific weight ratio of these components is crucial, ranging from 3/97 to 20/80. This invention demonstrates his commitment to advancing material science and engineering.

Career Highlights

Nobuhiro Nagayama is associated with Asahi Denka Kogyo Kabushiki Kaisha, a company known for its innovative chemical solutions. His role in the company has allowed him to develop and refine his ideas, contributing to the advancement of curable compositions in various applications.

Collaborations

Nagayama has worked alongside notable colleagues such as Hiroyuki Tachikawa and Kozaburo Takachika. Their collaborative efforts have further enhanced the research and development of new materials and technologies.

Conclusion

Nobuhiro Nagayama's contributions to the field of curable compositions highlight his innovative spirit and dedication to advancing technology. His patent and collaborations reflect a commitment to excellence in material science.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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