Shinmachi, Japan

Nobuhiro Iino

This inventor holds 1 USPTO granted patent. Top assignee: Other. Active years: 1977.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Nobuhiro Iino. Retrieved from https://idiyas.com/inventor/nobuhiro-iino

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 5(Granted Patents)


Company Filing History:

goldMedal1 out of 834,570 
Other
 patents

Years Active: 1977

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1 patent (USPTO):Explore Patents

Title: Nobuhiro Iino: Innovator in Writing Implement Technology

Introduction

Nobuhiro Iino is a notable inventor based in Oaza Shinmachi, Yashio, Saitama, Japan. He has made significant contributions to the field of writing implements, particularly with his innovative designs that enhance functionality and user experience.

Latest Patents

Iino holds a patent for a "Nib and shield for writing implement." This invention features a nib and shield that are coextruded from plastic material. The shield is designed to be coextensive with the nib over a major portion of its length, providing substantial reinforcement throughout. The design allows for the writing point to be exposed while ensuring that the nib end is accessible for ink reception. The tapered inner end of the shield facilitates easy insertion into the barrel of the writing implement.

Career Highlights

Throughout his career, Nobuhiro Iino has focused on developing practical solutions for everyday writing tools. His innovative approach has led to advancements that improve the durability and usability of writing implements.

Collaborations

Iino has worked alongside Harold F Bajusz, contributing to the development of new technologies in the writing implement sector.

Conclusion

Nobuhiro Iino's contributions to writing implement technology demonstrate his commitment to innovation and practicality. His patent reflects a thoughtful design that enhances the writing experience for users.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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