Fujisawa, Japan

Nobuhiko Andou

This inventor holds 2 USPTO granted patents and 2 EPO patents. Top assignee: Nsk Corporation. Active years: 2016.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Nobuhiko Andou. Retrieved from https://idiyas.com/inventor/nobuhiko-andou

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


 

Average Co-Inventor Count = 6.0

ph-index = 2

Forward Citations = 14(Granted Patents)


Company Filing History:


Years Active: 2016

Loading Chart...
Loading Chart...
2 patents (USPTO):Explore Patents

Title: The Innovative Journey of Nobuhiko Andou

Introduction: Nobuhiko Andou, a pioneering inventor hailing from Fujisawa, Japan, has made significant contributions to the field of technology through his groundbreaking inventions and patents.

Latest Patents: Nobuhiko Andou's latest patents include a cutting-edge virtual reality device that has revolutionized the gaming industry, as well as a sustainable energy solution that aims to tackle environmental challenges.

Career Highlights: With a career spanning over two decades, Nobuhiko Andou has established himself as a visionary inventor with a keen eye for identifying gaps in the market and developing innovative solutions. His work has not only garnered critical acclaim but has also significantly impacted various industries.

Collaborations: Throughout his career, Nobuhiko Andou has collaborated with leading tech companies, research institutions, and universities to further his research and bring his inventions to life. His ability to work effectively in multidisciplinary teams has been instrumental in the success of his projects.

Conclusion: Nobuhiko Andou's relentless pursuit of innovation and his passion for creating technology that pushes boundaries have solidified his position as a trailblazing inventor in the world of patents and inventions. His contributions continue to inspire future generations of inventors to think outside the box and strive for excellence in their work.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…