Akishima, Japan

Nobuaki Tamura

This inventor holds 1 USPTO granted patent. Top assignee: Jeol Ltd.. Active years: 1984.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Nobuaki Tamura. Retrieved from https://idiyas.com/inventor/nobuaki-tamura-pszsdtsd

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 27(Granted Patents)


Company Filing History:


Years Active: 1984

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1 patent (USPTO):Explore Patents

Title: Nobuaki Tamura: Innovator in Scanning Electron Microscopy

Introduction

Nobuaki Tamura is a distinguished inventor based in Akishimashi, Japan. He has made significant contributions to the field of scanning electron microscopy, particularly with his innovative designs that enhance the detection of secondary electrons.

Latest Patents

Tamura holds a patent for a "Device for detecting secondary electrons in a scanning electron microscope." This invention addresses the challenges faced in traditional scanning electron microscopes by incorporating a pipe electrode along the optical axis of the objective lens. This design ensures that the primary electron beam is not adversely affected by the detecting means, while a mesh electrode at positive potential attracts almost all secondary electrons towards the detecting means.

Career Highlights

Nobuaki Tamura is currently employed at Jeol Ltd., a company renowned for its advanced electron microscopy technologies. His work has been pivotal in advancing the capabilities of scanning electron microscopes, making them more efficient and effective for various applications.

Collaborations

Tamura has collaborated with Susumu Takashima, contributing to the development of innovative technologies in the field of electron microscopy.

Conclusion

Nobuaki Tamura's contributions to scanning electron microscopy through his patented inventions highlight his role as a key innovator in the field. His work continues to influence advancements in microscopy technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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