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For the Inventor, By the Inventor

Miyagi, Japan

Nobuaki Shindo

This inventor holds 4 USPTO granted patents and 2 published patent applications. Top assignee: Tokyo Electron Limited. Active years: 2016-2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Nobuaki Shindo. Retrieved from https://idiyas.com/inventor/nobuaki-shindo-ulhf856b

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 4 

% Patents Active = 100.0

Average Co-Inventor Count = 3.1

ph-index = 1

Forward Citations = 8(Granted Patents)


Company Filing History:

goldMedal4 out of 10,933 
 
Tokyo Electron Limited
 patents

Years Active: 2016-2024

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4 patents (USPTO):Explore Patents
1. 11887824 - Method of cleaning plasma processing apparatus and plasma processing apparatus (2024-01-30),
2. 11705309 - Substrate processing method (2023-07-18),
3. 11557498 - Substrate processing method and substrate processing apparatus (2023-01-17),
4. 9425028 - Plasma processing apparatus (2016-08-23),

Title: Nobuaki Shindo: Innovator in Plasma Processing Technology

Introduction

Nobuaki Shindo is a prominent inventor based in Miyagi, Japan. He has made significant contributions to the field of plasma processing technology, holding a total of 4 patents. His innovative approaches have advanced the efficiency and effectiveness of plasma processing apparatuses.

Latest Patents

Shindo's latest patents include a method of cleaning plasma processing apparatuses and a substrate processing method. The cleaning method involves disposing of a first dummy substrate at a specific position within a chamber and performing a dry cleaning process. Additionally, a second dummy substrate is placed at a different position, allowing for a comprehensive cleaning process. The substrate processing method focuses on changing the pressure and voltage applied to an electrostatic chuck, enhancing the electrostatic attraction of the substrate during processing.

Career Highlights

Nobuaki Shindo is currently employed at Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His work has been instrumental in developing advanced technologies that improve plasma processing efficiency.

Collaborations

Shindo collaborates with talented coworkers, including Yusei Kuwabara and Sachie Ishibashi. Their combined expertise contributes to the innovative projects at Tokyo Electron Limited.

Conclusion

Nobuaki Shindo's contributions to plasma processing technology exemplify the impact of innovation in the semiconductor industry. His patents and collaborative efforts continue to shape advancements in this critical field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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