Tokyo, Japan

Nobuaki Ohkawa

This inventor holds 2 USPTO granted patents. Top assignees: Toshiba Silicone Co., Ltd., Tama Chemicals Co., Ltd.. Active years: 1992-1998.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Nobuaki Ohkawa. Retrieved from https://idiyas.com/inventor/nobuaki-ohkawa

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 1.7

ph-index = 2

Forward Citations = 7(Granted Patents)


Location History:

  • Gunma, JP (1992)
  • Tokyo, JP (1998)

Company Filing History:


Years Active: 1992-1998

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2 patents (USPTO):Explore Patents

Title: Nobuaki Ohkawa: Innovator in Organosilane Technology

Introduction

Nobuaki Ohkawa is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of organosilane technology, holding a total of 2 patents. His work has had a considerable impact on various applications in the chemical industry.

Latest Patents

Ohkawa's latest patents include innovative processes that enhance the recovery and hydrolysis of organosilane compounds. His notable patents are:

1. Process for recovering organoalkoxysilane from polyorganosiloxane.

2. Method for hydrolyzing organochlorosilanes.

3. A method for hydrolyzing an organochlorosilane to produce an organopolysiloxane.

Career Highlights

Throughout his career, Nobuaki Ohkawa has worked with leading companies in the industry. He has been associated with Toshiba Silicone Co., Ltd. and Tama Chemicals Co., Ltd., where he has applied his expertise in organosilane technology.

Collaborations

Ohkawa has collaborated with notable professionals in his field, including Tsurahide Cho and Yoshiro Ohta. Their combined efforts have contributed to advancements in organosilane applications.

Conclusion

Nobuaki Ohkawa's innovative work in organosilane technology and his collaborations with industry leaders highlight his significant role in advancing chemical processes. His contributions continue to influence the field and inspire future innovations.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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