Tokyo, Japan

Nobuaki Nozawa

This inventor holds 1 USPTO granted patent. Top assignees: Bunka Shutter Co., Ltd., Lumitter Industry Co., Ltd.. Active years: 1986.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Nobuaki Nozawa. Retrieved from https://idiyas.com/inventor/nobuaki-nozawa

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 9(Granted Patents)


Company Filing History:


Years Active: 1986

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1 patent (USPTO):Explore Patents

Title: The Innovations of Nobuaki Nozawa

Introduction: Nobuaki Nozawa is a renowned inventor based in Tokyo, Japan, recognized for his contribution to the field of shutter devices. With a career marked by innovation and a commitment to advancing technology, he embodies the spirit of Japanese ingenuity.

Latest Patents: Nobuaki Nozawa holds one patent for a shutter device, showcasing his ability to create practical and effective solutions in the realm of manufacturing and mechanics. This invention highlights his expertise and his dedication to improving user experience in various applications.

Career Highlights: Throughout his career, Nozawa has worked with notable companies, including Bunka Shutter Co., Ltd. and Lumitter Industry Co., Ltd. His work in these organizations has been pivotal in the development and refinement of shutter technologies, contributing significantly to their product offerings.

Collaborations: Nozawa has collaborated with fellow inventor Koichi Kondo, fostering a partnership that has led to innovative ideas and advancements in their respective fields. Their combined efforts exemplify the power of collaboration in driving technological progress.

Conclusion: Nobuaki Nozawa's dedication to innovation and his contributions to shutter device technology position him as a significant figure in the industry. His patents and collaborations reflect a successful career characterized by a commitment to excellence and advancement in technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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