Noboru Saito

Title: Noboru Saito: Innovator in Plasma Processing Technology

Introduction

Noboru Saito is a prominent inventor based in Miyagi, Japan. He is known for his contributions to plasma processing technology, particularly in the semiconductor industry. His innovative work has led to the development of methods that enhance the efficiency and effectiveness of plasma processing systems.

Latest Patents

Noboru Saito holds a patent for a plasma processing method and plasma processing system. This patent describes a method performed in a plasma processing apparatus that includes a chamber. The method involves providing a substrate with a film stack that includes a silicon oxide film and a silicon nitride film. The process includes forming a plasma from a processing gas containing HF gas and at least one of CF gas and phosphorus-containing gas to etch the film stack. The substrate support is controlled to a temperature between 0° C. and 70° C., with a bias RF signal of 10 kW or more or a bias DC signal of 4 kV or more supplied to the substrate support. This innovative approach significantly improves the plasma processing capabilities.

Career Highlights

Noboru Saito is associated with Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His work at the company has been instrumental in advancing plasma processing technologies. His expertise and innovative mindset have contributed to the company's reputation for excellence in the field.

Collaborations

Noboru Saito has collaborated with notable colleagues, including Satoshi Ohuchida and Koki Mukaiyama. These collaborations have fostered a creative environment that encourages the development of cutting-edge technologies in plasma processing.

Conclusion

Noboru Saito's contributions to plasma processing technology exemplify the spirit of innovation in the semiconductor industry. His patented methods and collaborative efforts continue to influence advancements in this critical field.