This inventor holds 1 USPTO granted patent. Top assignee: Rensselaer Polytechnic Institute. Active years: 2004.
Company Filing History:
Years Active: 2004
Title: Innovations of Ning Lu in Semiconductor Materials
Introduction
Ning Lu is an accomplished inventor based in Troy, NY (US). She has made significant contributions to the field of semiconductor materials, particularly through her innovative patent related to low dielectric constant films.
Latest Patents
Ning Lu holds a patent for "Low dielectric constant films derived by sol-gel processing of a hyperbranched polycarbosilane." This hybrid organic/inorganic organosilicon networked polymer material has a compositional formula of [Si(O)CH] and boasts a dielectric constant of less than 2.4. The material is designed for use as an interlayer dielectric film in semiconductor devices. The fabrication of this film is preferably achieved through a sol-gel process utilizing an alkoxy substituted hyperbranched polycarbosilane precursor material. She has 1 patent to her name.
Career Highlights
Ning Lu is affiliated with Rensselaer Polytechnic Institute, where she continues to advance her research in materials science. Her work has garnered attention for its potential applications in the semiconductor industry.
Collaborations
Ning Lu has collaborated with Leonard V Interrante, contributing to the development of innovative materials and technologies.
Conclusion
Ning Lu's contributions to the field of semiconductor materials through her patent demonstrate her innovative spirit and commitment to advancing technology. Her work continues to influence the industry and pave the way for future developments.