This inventor holds 1 USPTO granted patent. Top assignees: Amia Corporation, Persee Chemical Co., Ltd.. Active years: 2005.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2005
Title: Innovator Ning Gao - Pioneering Photo-Chemical Remediation in Norwood, NY
Introduction
Ning Gao is a notable inventor based in Norwood, NY, who has made significant strides in the field of environmental technology. With a focus on innovative solutions for waste management, she holds a patent that addresses the remediation of copper and chemical mechanical polishing (Cu-CMP) waste.
Latest Patents
Ning Gao's patent, titled "Photo-Chemical Remediation of Cu-CMP Waste," presents a groundbreaking method for treating waste streams that contain copper ions and organic pollutants. This innovative process involves adding photo-catalyst particles to the waste streams and exposing them to UV light or sunlight. Through this method, copper ions are deposited onto the surfaces of these particles, effectively removing them from the waste. In addition, the organic and inorganic pollutants are decomposed via the photolysis capability of the photo-catalysts, ensuring that the waste meets environmental discharge standards.
Career Highlights
Gao has worked with prominent companies, including Amia Corporation and Persee Chemical Co., Ltd., where she contributed her expertise in environmental technology and waste management. Her innovative approach has garnered attention and recognition within the industry, highlighting her commitment to sustainable solutions.
Collaborations
Throughout her career, Ning has collaborated with talented professionals such as Yuzhuo Li and Jason Keleher. These partnerships have played a significant role in advancing her research and developing practical applications for her inventions, further establishing her impact in the field of environmental remediation.
Conclusion
Ning Gao stands out as an inventor dedicated to addressing environmental challenges through her innovative approaches to waste management. Her patent for the photo-chemical remediation of Cu-CMP waste exemplifies her commitment to sustainability and the importance of clean technology in today's world. As she continues her work, her contributions are likely to inspire future innovations in the environmental sector.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile