Shelton, CT, United States of America

Nilesh Kapadia


 

Average Co-Inventor Count = 2.0

ph-index = 2

Forward Citations = 9(Granted Patents)


Company Filing History:

goldMedal7 out of 832,718 
Other
 patents

Years Active: 2008-2015

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7 patents (USPTO):Explore Patents

Title: Nilesh Kapadia: Innovator in Adhesion Promoting Technologies

Introduction

Nilesh Kapadia is a notable inventor based in Shelton, CT (US). He has made significant contributions to the field of adhesion promoting technologies, holding a total of 7 patents. His work focuses on enhancing the adhesion of polymeric materials to metal surfaces, which is crucial in various industrial applications.

Latest Patents

One of Nilesh's latest patents is an adhesion promoting composition for metal leadframes. This innovative process involves increasing the adhesion of a polymeric material to a metal surface. The process comprises contacting the metal surface with an adhesion promoting composition that includes an oxidizer, an inorganic acid, a corrosion inhibitor, and an organic phosphonate. The organic phosphonate plays a vital role in stabilizing the oxidizer and organic components present in the bath, preventing their decomposition. This enhancement significantly increases the working life of the bath, especially when used with copper alloys that have a high iron content.

Career Highlights

Throughout his career, Nilesh has worked with various companies, including Macdermid Acumen, Inc. His expertise in adhesion technologies has made him a valuable asset in the industry. His innovative approaches have led to advancements that benefit manufacturing processes and product durability.

Collaborations

Nilesh has collaborated with notable professionals in his field, including Kesheng Feng and Steven A Castaldi. These collaborations have fostered a creative environment that encourages the development of cutting-edge technologies.

Conclusion

Nilesh Kapadia's contributions to adhesion promoting technologies demonstrate his commitment to innovation and excellence. His patents and collaborations reflect a dedication to advancing industrial applications, making him a prominent figure in his field.

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