Company Filing History:
Years Active: 2022-2025
Title: Innovations of Nikolay Yeremin in Chemical-Mechanical Polishing
Introduction
Nikolay Yeremin is an accomplished inventor based in San Jose, CA (US). He has made significant contributions to the field of chemical-mechanical polishing (CMP) with a focus on enhancing the efficiency and control of the polishing process. With a total of 3 patents to his name, Yeremin continues to push the boundaries of innovation in his field.
Latest Patents
One of his latest patents is a chemical-mechanical polishing system that incorporates a potentiostat and pulsed-force applied to a workpiece. This invention addresses shortcomings associated with insufficient control in conventional CMP processes. The CMP apparatus is designed to complement a constant force, which a workpiece is typically exposed to, with a time-alternating force. Additionally, it includes means for measuring an electrical characteristic of the CMP process. The time-alternating force is applied using a system component that is electrically isolated from the workpiece and is situated in the carrier-chick where the workpiece is affixed for the CMP process. The electrical characteristic is measured using a carefully configured reservoir that collects the used fluid. This innovative CMP apparatus significantly improves the control and effectiveness of the polishing process.
Career Highlights
Nikolay Yeremin is currently employed at Bruker Nano GmbH, where he continues to develop cutting-edge technologies in the field of nano-scale materials and processes. His work at Bruker Nano GmbH has positioned him as a key player in advancing CMP technologies.
Collaborations
Yeremin collaborates with fellow inventor Vladimir Gulkov, contributing to the development of innovative solutions in their field. Their partnership exemplifies the importance of teamwork in driving technological advancements.
Conclusion
Nikolay Yeremin's contributions to the field of chemical-mechanical polishing demonstrate his commitment to innovation and excellence. His patents reflect a deep understanding of the challenges in CMP processes and offer practical solutions that enhance performance.