St. Petersburg, Russia

Nikolay Nikolaevich Guletsky


Average Co-Inventor Count = 3.6

ph-index = 4

Forward Citations = 31(Granted Patents)


Company Filing History:


Years Active: 2005-2010

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4 patents (USPTO):Explore Patents

Title: Inventor Nikolay Nikolaevich Guletsky: Innovations in Photomask Technology

Introduction

Nikolay Nikolaevich Guletsky is a renowned inventor based in St. Petersburg, Russia, known for his significant contributions to the field of photomask technology. With a total of four patents to his name, Guletsky has made remarkable advancements in methods and apparatus utilized in the manufacturing of reticles and photomasks, addressing challenges related to critical dimension variations.

Latest Patents

Guletsky's latest patents showcase his innovative approach to resolving critical issues in photomask engineering. One of his notable inventions is a "Method for correcting critical dimension variations in photomasks." This method involves compensating for variations in critical dimensions of pattern lines on wafers by correcting the corresponding photomask. By incorporating Shading Elements within the substrate of the photomask, Guletsky's technique effectively addresses areas with significant CD variations, thereby enhancing the tolerance on the wafer.

Another significant patent introduced by Guletsky is the "Method and apparatus for the manufacturing of reticles." This inventive approach focuses on creating patterns on reticle blanks using ultra-short pulsed laser beams. The method enables precise manufacturing processes and improved results, making it a substantial contribution to the field.

Career Highlights

Throughout his career, Nikolay Guletsky has been associated with several companies that have enriched his expertise. Notable among these are U-C-Laser Ltd. and Pixer Technology Ltd., where he played a pivotal role in advancing technologies related to photomasks and reticles. His work at these organizations has established him as a key figure in the field of optics and lithography.

Collaborations

In his journey as an inventor, Guletsky has collaborated with esteemed professionals in the industry, including Vladimir Dmitriev and Sergey Oshemkov. These collaborations have bolstered his research efforts and contributed significantly to the development of innovative technologies in photomask manufacturing.

Conclusion

Nikolay Nikolaevich Guletsky's achievements highlight the importance of innovation in the realm of photomask technology. By addressing critical issues through his patented inventions, he continues to influence the manufacturing sector significantly. His dedication to research and collaboration exemplifies the spirit of innovation that drives the industry forward.

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