Bethesda, MD, United States of America

Nikhil Niraj Gheewala

This inventor holds 1 USPTO granted patent and 2 published patent applications and 1 EPO patent. Top assignee: Acell, Inc.. Active years: 2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Nikhil Niraj Gheewala. Retrieved from https://idiyas.com/inventor/nikhil-niraj-gheewala

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0


Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2024

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1 patent (USPTO):Explore Patents

Title: Nikhil Niraj Gheewala: Innovator in Medical Device Technology

Introduction

Nikhil Niraj Gheewala is a prominent inventor based in Bethesda, MD, specializing in medical device technology. He has made significant contributions to the field through his innovative work in developing advanced materials for wound healing.

Latest Patents

Nikhil holds a patent for "Porous foams derived from extracellular matrix, porous foam ECM medical devices, and methods of use and making thereof." This invention focuses on a porous wound healing foam composition derived from the extracellular matrix of mammals, detailing methods for its creation and application.

Career Highlights

Nikhil Gheewala is currently employed at Acell, Inc., where he continues to advance the development of medical devices. His work is instrumental in enhancing the effectiveness of wound healing solutions.

Collaborations

Some of Nikhil's notable coworkers include Chandra M Valmikinathan and Brent Donald Young, who contribute to the innovative environment at Acell, Inc.

Conclusion

Nikhil Niraj Gheewala's contributions to medical device technology, particularly in wound healing, highlight his role as a key innovator in the field. His patent and ongoing work at Acell, Inc. demonstrate his commitment to improving healthcare solutions.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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