Allschwil, Switzerland

Niels Holm Larsen

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: 3D Systems, Inc.. Active years: 2013.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Niels Holm Larsen. Retrieved from https://idiyas.com/inventor/niels-holm-larsen

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 1 

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2013

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1 patent (USPTO):Explore Patents

Title: Niels Holm Larsen: Innovator in Rapid Prototyping Technology

Introduction

Niels Holm Larsen is a prominent inventor based in Allschwil, Switzerland. He has made significant contributions to the field of rapid prototyping technology, particularly through his innovative work with stereolithography apparatus.

Latest Patents

Larsen holds 1 patent for his invention titled "Improvements for rapid prototyping apparatus." This patent focuses on a stereolithography apparatus and an exposure system that utilizes light-emitting diodes as light sources. The invention addresses the alignment of light from the light-emitting diode and the exchange and control of these diodes, enhancing the efficiency and effectiveness of rapid prototyping processes.

Career Highlights

Niels Holm Larsen is currently employed at 3D Systems, Inc., a leading company in the 3D printing industry. His work at this organization has allowed him to further develop his ideas and contribute to advancements in rapid prototyping technologies.

Collaborations

Larsen has collaborated with notable colleagues, including Ole Hangaard and Emilie Pougeoise, who have also contributed to the field of 3D printing and rapid prototyping.

Conclusion

Niels Holm Larsen's innovative work in rapid prototyping technology exemplifies the impact of inventors in advancing modern manufacturing techniques. His contributions continue to influence the industry and inspire future innovations.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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