Fishkill, NY, United States of America

Nicole R Reardon

This inventor holds 2 USPTO granted patents. Top assignee: International Business Machines Corporation. Active years: 2017-2018.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Nicole R Reardon. Retrieved from https://idiyas.com/inventor/nicole-r-reardon

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2017-2018

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2 patents (USPTO):Explore Patents

Title: Innovations by Nicole R. Reardon

Introduction

Nicole R. Reardon is a notable inventor based in Fishkill, NY (US). She has made significant contributions to the field of semiconductor technology. With a total of 2 patents, her work focuses on enhancing the efficiency and reliability of semiconductor substrates.

Latest Patents

Nicole's latest patents include innovative methods for insulating a via in a semiconductor substrate. The process involves several key steps: depositing a dielectric layer in the via, followed by a barrier layer, allowing the barrier layer to oxidize, and finally depositing a conducting layer. This method aims to improve the performance of semiconductor devices.

Career Highlights

Nicole R. Reardon is currently employed at International Business Machines Corporation, commonly known as IBM. Her role at IBM allows her to work on cutting-edge technologies and contribute to advancements in the semiconductor industry.

Collaborations

Throughout her career, Nicole has collaborated with talented individuals such as Mukta G. Farooq and Jennifer A. Oakley. These collaborations have fostered innovation and have been instrumental in her research and development efforts.

Conclusion

Nicole R. Reardon is a pioneering inventor whose work in semiconductor technology has led to significant advancements. Her contributions continue to shape the future of the industry, and her patents reflect her commitment to innovation.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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