Cologne, Germany

Nicolas Stoeckel

This inventor holds 3 USPTO granted patents and 2 published patent applications and 8 EPO patents. Top assignees: Bayer Materialscience Ag, Covestro Deutschland Ag. Active years: 2010-2022.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Nicolas Stoeckel. Retrieved from https://idiyas.com/inventor/nicolas-stoeckel

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 3 

% Patents Active = 66.7

 

Average Co-Inventor Count = 4.0

ph-index = 2

Forward Citations = 9(Granted Patents)


Location History:

  • Köln, DE (2010)
  • Cologne, DE (2010 - 2022)

Company Filing History:


Years Active: 2010-2022

Loading Chart...
Loading Chart...
3 patents (USPTO):Explore Patents

Title: Nicolas Stoeckel - Innovator in Holographic Technologies.

Introduction

Nicolas Stoeckel is an inventor based in Koeln, Germany. He is known for his work in the field of holographic technologies. Although he currently holds no granted patents, his innovative ideas are reflected in his latest patent applications.

Latest Patent Applications

Stoeckel's recent patent applications include "MEDIA FOR VOLUME-HOLOGRAPHIC RECORDING BASED ON SELF-DEVELOPING POLYMER." This invention relates to novel self-developing films for the incorporation of volume holograms by exposure, along with a method for their production and use. Another significant application is "PHOTOPOLYMER COMPOSITIONS FOR OPTICAL ELEMENTS AND VISUAL DISPLAYS." This invention focuses on novel photopolymers based on specific urethane acrylates as writing monomers, which are suitable for producing holographic media, particularly for the visual display of images.

Conclusion

Nicolas Stoeckel is an emerging inventor whose work in holographic technologies shows great promise for future advancements in the field. His innovative patent applications highlight his commitment to developing new solutions in optical media.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…