Saint-Doulchard, France

Nicolas Sibilaud

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Mbda France. Active years: 2015.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Nicolas Sibilaud. Retrieved from https://idiyas.com/inventor/nicolas-sibilaud

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

 

Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2015

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1 patent (USPTO):Explore Patents

Title: The Innovations of Nicolas Sibilaud

Introduction

Nicolas Sibilaud is a notable inventor based in Saint-Doulchard, France. He has made significant contributions to the field of marking devices, particularly in the context of practice rounds. His innovative approach has led to the development of a unique impact marking device.

Latest Patents

Nicolas holds a patent for an "Impact marking device for practice round and round equipped with such a device." This invention features a shape of revolution and includes a casing with a conical bottom, which is sealed with an obturator. Inside the device, there is a block of compacted marking product, showcasing his ingenuity in design and functionality.

Career Highlights

Nicolas Sibilaud is currently employed at MBDA France, a leading company in the defense sector. His work there has allowed him to apply his inventive skills in a practical environment, contributing to advancements in military technology.

Collaborations

Nicolas has collaborated with notable coworkers, including Patrick Barthelemy and Marc Ferrat. Their teamwork has likely fostered an environment of innovation and creativity within their projects.

Conclusion

Nicolas Sibilaud's contributions to the field of marking devices exemplify the spirit of innovation. His patent and work at MBDA France highlight his role as a significant inventor in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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