Ingolstadt, Germany

Nicolas Schmidts


Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2016

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1 patent (USPTO):

Title: The Innovations of Nicolas Schmidts

Introduction

Nicolas Schmidts is a prominent inventor based in Ingolstadt, Germany. He has made significant contributions to the field of microlithography, particularly in the development of advanced optical systems. His work is characterized by a focus on enhancing illumination parameters in lithographic processes.

Latest Patents

Nicolas Schmidts holds a patent for an "EUV microlithography illumination optical system and EUV attenuator for same." This innovative illumination optical system is designed to direct an illumination light beam from a radiation source to an object field. The system incorporates at least one EUV mirror with a reflective face featuring nonplanar mirror topography, which is essential for forming the illumination light beam. Additionally, the EUV mirror is equipped with at least one EUV attenuator positioned in front of it. The attenuator face is designed to complement the mirror topography, ensuring that sections of the attenuator face are maintained at a constant interval from the reflective face. This design allows for the correction of unwanted variations in illumination parameters, such as intensity distribution and angle distribution, while minimizing unwanted radiation losses.

Career Highlights

Nicolas Schmidts is currently employed at Carl Zeiss SMT GmbH, a leading company in the field of optical systems and lithography technology. His work at this esteemed organization has allowed him to push the boundaries of innovation in microlithography.

Collaborations

Throughout his career, Nicolas has collaborated with notable colleagues, including Joachim Hartjes and Ulrich Bingel. These collaborations have contributed to the advancement of technologies in the field of microlithography.

Conclusion

Nicolas Schmidts is a key figure in the realm of microlithography, with a focus on developing innovative optical systems that enhance illumination parameters. His contributions, particularly through his patent, demonstrate his commitment to advancing technology in this critical field.

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