Paris, France

Nicolas Pmf Bonnier

This inventor holds 1 USPTO granted patent. Top assignee: Oce-Technologies B.v.. Active years: 2014.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Nicolas Pmf Bonnier. Retrieved from https://idiyas.com/inventor/nicolas-pmf-bonnier

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2014

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1 patent (USPTO):Explore Patents

Title: Innovations by Nicolas Pmf Bonnier

Introduction

Nicolas Pmf Bonnier is an accomplished inventor based in Paris, France. He has made significant contributions to the field of printing technology, particularly in optimizing print quality while managing ink usage. His innovative approach has led to the development of a unique method that enhances the printing process.

Latest Patents

Nicolas holds a patent for a method titled "Method for combining direct binary search halftoning with ink saving." This method focuses on printing images with color pixels while optimizing print quality for a selected level of ink usage. By maximizing a dot-off-dot strategy and effectively managing the use of black colorant, his invention minimizes perceived errors in halftone textures according to a human visual system model.

Career Highlights

Nicolas is currently associated with Oce-Technologies B.V., where he continues to innovate in the printing sector. His work has been instrumental in advancing printing technologies that balance quality and efficiency.

Collaborations

Throughout his career, Nicolas has collaborated with notable professionals, including Maria V Ortiz Segovia and Jan Philip Allebach. These collaborations have further enriched his contributions to the field.

Conclusion

Nicolas Pmf Bonnier's innovative methods in printing technology demonstrate his commitment to enhancing print quality while conserving ink. His work continues to influence the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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