Soest, Netherlands

Nicolaas E Hemkes


Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 8(Granted Patents)


Company Filing History:


Years Active: 1993

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1 patent (USPTO):Explore Patents

Title: **Innovative Contributions of Nicolaas E. Hemkes in Process Control**

Introduction

Nicolaas E. Hemkes is an influential inventor based in Soest, NL, recognized for his significant contribution to the field of process control. With a keen understanding of statistical characteristics and controlled variables, he has developed innovative solutions that enhance the efficiency of process monitoring.

Latest Patents

One of Hemkes' notable patents is titled "Method and apparatus for process control with optimum setpoint." This invention details an improved setpoint control system designed for use in conjunction with process control equipment. The system effectively generates signals that represent statistical characteristics of batches, or subgroups, of monitored values of a controlled variable. Through these signals, Hemkes' invention derives an optimum setpoint signal that combines a specification limit with a scaled value of the standard deviation of averages for each batch of controlled variable values.

Career Highlights

Nicolaas E. Hemkes is affiliated with The Foxboro Company, where his innovative approach towards process control has made a remarkable impact. His expertise and contributions reflect a deep comprehension of process dynamics and controls, making him a valuable asset to his organization.

Collaborations

In his professional journey, Hemkes has collaborated with dedicated colleagues, including Paul C. Badavas and Nicholas P. DiVittorio. These collaborations exemplify the teamwork and shared commitment to innovation within The Foxboro Company, bringing together diverse expertise to advance their field.

Conclusion

Nicolaas E. Hemkes stands out as a key inventor in the realm of process control, bringing forth advancements that help streamline processes across various industries. His inventive spirit and collaborative efforts continue to shape the future of technology in this vital area.

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