Oegstgeest, Netherlands

Nicola Avella

This inventor holds 1 USPTO granted patent and 2 published patent applications. Top assignee: Avery Dennison Corporation. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Nicola Avella. Retrieved from https://idiyas.com/inventor/nicola-avella

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Nicola Avella: Innovator in Polyurethane Synthesis

Introduction

Nicola Avella is a notable inventor based in Oegstgeest, Netherlands. He has made significant contributions to the field of polyurethane synthesis, showcasing his expertise through his innovative patent.

Latest Patents

Nicola Avella holds a patent for a method of producing a polyurethane film. This method includes the steps of depositing a prepolymer composition, drying the prepolymer composition, and crosslinking the prepolymer composition. His work in this area has led to advancements in the production of polyurethane materials.

Career Highlights

Avella is currently employed at Avery Dennison Corporation, where he continues to develop and refine his innovative ideas. His role at the company allows him to apply his knowledge and skills in a practical setting, contributing to the advancement of materials science.

Collaborations

Some of his coworkers include David G Bland and Danny Hartinger, who collaborate with him on various projects within the company.

Conclusion

Nicola Avella's contributions to polyurethane synthesis and his innovative approach to material production highlight his importance in the field. His patent and ongoing work at Avery Dennison Corporation demonstrate his commitment to advancing technology in this area.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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