Towanda, PA, United States of America

Nicholas Wayne Rench

This inventor holds 1 USPTO granted patent. Top assignee: Gte Sylvania Incorporated. Active years: 1977.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Nicholas Wayne Rench. Retrieved from https://idiyas.com/inventor/nicholas-wayne-rench

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 1977

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1 patent (USPTO):Explore Patents

Title: Innovations of Nicholas Wayne Rench

Introduction

Nicholas Wayne Rench is an accomplished inventor based in Towanda, PA (US). He has made significant contributions to the field of metallurgy through his innovative designs and methods. His work focuses on enhancing the efficiency of molten metal processing.

Latest Patents

Nicholas holds a patent for an "Apparatus for providing a stream of molten metal from a metallic ingot." This invention involves a method for maintaining a specific level of molten metal within the apparatus's chamber. The molten metal is further heated to an established temperature, facilitating its passage through the apparatus's orifice.

Career Highlights

Nicholas is associated with GTE Sylvania Incorporated, where he applies his expertise in metal processing technologies. His work has contributed to advancements in the manufacturing sector, particularly in the production of high-quality metal components.

Collaborations

Some of his notable coworkers include William Daniel Lafferty and James Thomas Smith. Their collaborative efforts have further enhanced the innovative environment at GTE Sylvania Incorporated.

Conclusion

Nicholas Wayne Rench's contributions to the field of metallurgy through his patent and work at GTE Sylvania Incorporated highlight his role as a significant inventor. His innovative approach to molten metal processing continues to influence the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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