Mundelein, IL, United States of America

Nicholas R Dicola

This inventor holds 1 USPTO granted patent and 8 published patent applications. Top assignee: Fenwal, Inc.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Nicholas R Dicola. Retrieved from https://idiyas.com/inventor/nicholas-r-dicola

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Nicholas R. Dicola and Dynamic Pump Calibration

Introduction

Nicholas R. Dicola is an inventor associated with Mundelein, Illinois, and Fenwal, Inc. His patent work addresses the measurement and adjustment of pump stroke volume during fluid processing.

Latest Patents

Dicola is credited with 1 patent: “Dynamic Calibration and Correction of Stroke Volume of a Pump.” The patent describes methods for checking whether a fluid container’s volume measurement system is operating reliably by analyzing volume changes over multiple time periods. When the system meets a specified reliability threshold, the pump’s stroke volume is calculated. The system then compares the target and actual volume changes, calculates a correction factor if they differ, and adjusts pump operation accordingly.

Career Highlights

Dicola’s listed invention focuses on improving the accuracy of pump operation through dynamic calibration and correction. His company affiliation is Fenwal, Inc.

Collaborations

Francesca S. Quezada is identified as Dicola’s coworker. The available information does not specify her role in the patent or whether she collaborated on the invention.

Conclusion

Nicholas R. Dicola’s patent describes a method for monitoring measurement reliability and correcting pump stroke volume, highlighting his contribution to fluid-processing technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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