Company Filing History:
Years Active: 2022-2025
Title: An Overview of Inventor Nicholas J. Kybert
Introduction
Nicholas J. Kybert is an accomplished inventor based in Portland, Oregon. He is recognized for his innovative contributions to the field of semiconductor technology and has secured a patent that significantly enhances integrated circuit fabrication processes.
Latest Patents
Kybert holds a patent titled "Contact over active gate structures with etch stop layers for advanced integrated circuit structure fabrication." This invention describes a methodology for fabricating contact over active gate (COAG) structures utilizing etch stop layers. The integrated circuit structure outlined in his patent incorporates a plurality of gate structures that rest above a substrate, each featuring a gate insulating layer. The design includes alternating conductive trench contact structures, each with a trench insulating layer. This arrangement is further enhanced by a first dielectric etch stop layer that is continuous over both the trench insulating layers and the gate insulating layers. Additionally, a distinct second dielectric etch stop layer enhances the structure's capability, supporting an interlayer dielectric material placed on top.
Career Highlights
Kybert is employed at Intel Corporation, a leading company in the semiconductor industry. His work at Intel has established him as a key player in the research and development of advanced integrated circuit technologies. His patent reflects not only his technical expertise but also his commitment to driving innovation within the industry.
Collaborations
Throughout his career, Nicholas has collaborated with notable engineers such as Atul Madhavan and Mohit K. Haran. These partnerships have allowed for a diverse exchange of ideas and development practices, further accelerating advancements in integrated circuit fabrication.
Conclusion
Nicholas J. Kybert continues to be a driving force within the semiconductor sector, making significant strides in the refinement of integrated circuit technologies. His patent on COAG structures showcases his inventive spirit and dedication to enhancing fabrication methods, promising to influence the future of semiconductor manufacturing practices.