Livonia, MI, United States of America

Niaz Khwaja

This inventor holds 1 USPTO granted patent. Top assignee: Ford Global Technolgoies, LLC. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Niaz Khwaja. Retrieved from https://idiyas.com/inventor/niaz-khwaja

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Niaz Khwaja: Innovator in Vent Device Technology

Introduction

Niaz Khwaja is a notable inventor based in Livonia, MI (US). He has made significant contributions to the field of vent device technology. His innovative approach has led to the development of a unique patent that addresses the needs of gas flow management.

Latest Patents

Niaz Khwaja holds a patent for a vent device. This patent includes methods and systems designed to enhance the efficiency of gas venting. The vent device features a body that extends through a housing, with a spherical flow element positioned adjacent to a cap. This cap allows gases to flow through openings, enabling effective venting to the ambient atmosphere. He has 1 patent to his name.

Career Highlights

Niaz Khwaja is currently employed at Ford Global Technologies, LLC. His work at Ford has allowed him to apply his inventive skills in a practical setting, contributing to advancements in automotive technology. His dedication to innovation is evident in his patent work and ongoing projects.

Collaborations

Some of Niaz Khwaja's coworkers include Robert Sunde and Emad Al-Regib. Their collaboration fosters a creative environment that encourages the development of new ideas and technologies.

Conclusion

Niaz Khwaja is a prominent figure in the field of vent device technology, with a focus on innovative solutions for gas flow management. His contributions through his patent and work at Ford Global Technologies, LLC highlight his commitment to advancing technology in this area.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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