Shenzhen, China

Nianxian Lin

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Huawei Technologies Co., Limited. Active years: 2022.


% Patents Active = 100.0

 

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2022

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1 patent (USPTO):Explore Patents

Title: Nianxian Lin: Innovator in Frequency Scaling Technology

Introduction

Nianxian Lin is a prominent inventor based in Shenzhen, China. He has made significant contributions to the field of technology, particularly in the area of frequency scaling methods. His innovative approach addresses the challenges of energy efficiency in processing images.

Latest Patents

Nianxian Lin holds a patent for a method and apparatus related to frequency scaling responding to a performance change. This patent, titled "Frequency scaling responding to a performance change method and apparatus and computer-readable storage medium," outlines a method that predicts an energy efficiency parameter for processing a current frame of an image. The method involves selecting a frequency set that meets energy efficiency requirements and scaling the working frequency of processing modules accordingly. This innovative solution allows for timely responses to load change requirements during frequency scaling processes. He has 1 patent to his name.

Career Highlights

Nianxian Lin is currently employed at Huawei Technologies Co., Limited, a leading global provider of information and communications technology (ICT) infrastructure and smart devices. His work at Huawei has positioned him at the forefront of technological advancements in the industry.

Collaborations

Nianxian Lin has collaborated with notable colleagues, including Qing Ding and Peng Li. Their combined expertise contributes to the innovative projects at Huawei.

Conclusion

Nianxian Lin's contributions to frequency scaling technology exemplify his commitment to enhancing energy efficiency in image processing. His innovative methods and collaborative efforts continue to influence the technology landscape.

Profile summary based on public USPTO records.
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