This inventor holds 1 USPTO granted patent. Top assignee: Genisys Gmbh. Active years: 2019.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2019
Title: Nezih Uenal: Innovator in Beam Lithography
Introduction
Nezih Uenal is a prominent inventor based in Taufkirchen, Germany. He has made significant contributions to the field of beam lithography, a crucial technology in the manufacturing of microelectronics. His innovative approach has led to the development of a unique patent that enhances the precision of lithographic processes.
Latest Patents
Nezih Uenal holds a patent titled "Process Dose and Process Bias Determination for Beam Lithography." This patent outlines a technique and method for determining a process dose for a beam lithography process. The method involves accessing a data set that associates measured dimensions of features exposed by beam lithography with various exposure doses. It also incorporates parameters such as feature density and nominal dimensions to provide a comprehensive model for fitting the data set. This innovative approach allows for accurate determination of both process dose and process bias, significantly improving the efficiency of beam lithography.
Career Highlights
Nezih Uenal is currently employed at Genisys GmbH, where he continues to push the boundaries of technology in the field of lithography. His work has been instrumental in advancing the capabilities of beam lithography, making it a vital tool in modern manufacturing processes. Uenal's expertise and dedication to innovation have established him as a key figure in his field.
Collaborations
Nezih Uenal collaborates with various professionals in the industry, including his coworker Ulrich Hofmann. Their combined efforts contribute to the ongoing development and refinement of lithographic techniques, fostering a collaborative environment that encourages innovation.
Conclusion
Nezih Uenal's contributions to beam lithography exemplify the impact of innovative thinking in technology. His patent and ongoing work at Genisys GmbH highlight the importance of precision in manufacturing processes. Uenal's dedication to advancing this field continues to inspire future innovations.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile