Buenos Aires, Argentina

Nestor Failache

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Sika Technology Ag. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Nestor Failache. Retrieved from https://idiyas.com/inventor/nestor-failache

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

 

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Nestor Failache: Innovator in Water-Based Adhesives

Introduction

Nestor Failache is a notable inventor based in Buenos Aires, Argentina. He has made significant contributions to the field of adhesive technology, particularly with his innovative approach to water-based compositions.

Latest Patents

Nestor holds a patent for a water-based composition with chemical cross-linking. This single-component sealant or adhesive composition includes an aqueous polymer dispersion, which consists of water and at least one water-dispersed polymer. The formulation also incorporates a water-dispersed or water-dissolved epoxy- or isocyanate-functional cross-linker, ensuring enhanced performance and versatility in various applications.

Career Highlights

Nestor is currently associated with Sika Technology AG, a company renowned for its expertise in construction and industrial materials. His work focuses on developing innovative adhesive solutions that meet the demands of modern applications.

Collaborations

Throughout his career, Nestor has collaborated with esteemed colleagues such as Steffen Maier and Michael Schlumpf. These partnerships have fostered a creative environment that encourages the development of cutting-edge technologies.

Conclusion

Nestor Failache's contributions to adhesive technology exemplify the importance of innovation in creating effective and sustainable solutions. His work continues to influence the industry and inspire future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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