Bear, DE, United States of America

Neng Xiao

This inventor holds 1 USPTO granted patent and 2 published patent applications. Top assignee: Dupont Electronics, Inc.. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Neng Xiao. Retrieved from https://idiyas.com/inventor/neng-xiao-0ofhit22

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 8.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Neng Xiao: Innovator in Polymer Film Technology

Introduction

Neng Xiao is a prominent inventor based in Bear, Delaware, known for his contributions to the field of materials science. He has developed innovative technologies that enhance the performance of electronic components through the use of advanced materials.

Latest Patents

Neng Xiao holds a patent for "Articles having inorganic substrates and polymer film layers." This invention involves an article that includes an inorganic substrate made from materials such as ceramic, glass, or glass-ceramic, combined with a polymer film layer that contains an imide group. The unique composition allows for improved performance in electronic applications, particularly in how the materials interact at their interface.

Career Highlights

Neng Xiao is currently employed at DuPont Electronics, Inc., where he applies his expertise in materials science to develop cutting-edge technologies. His work focuses on creating innovative solutions that meet the demands of modern electronics.

Collaborations

Throughout his career, Neng has collaborated with talented professionals, including Kostantinos Kourtakis and Benjamin Samson. These collaborations have contributed to the advancement of his research and the successful development of new technologies.

Conclusion

Neng Xiao's work in polymer film technology and inorganic substrates represents a significant advancement in materials science. His innovative approach continues to influence the electronics industry, showcasing the importance of research and development in creating effective solutions.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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