Neng-hsing Lu

Title: The Innovative Contributions of Neng-hsing Lu in Plasma Processing

Introduction: Neng-hsing Lu, an accomplished inventor based in Endwell, NY, has made significant strides in the field of plasma processing technology. With a total of four patents to his name, his inventions demonstrate a profound impact on the techniques used for etching materials in various applications. His latest patents showcase inventive approaches to plasma processing, underlining his expertise and innovative mindset.

Latest Patents: Neng-hsing Lu's recent innovations include two noteworthy patents. The first is a "Plasma Processing Apparatus Including Three Bus Structures," which presents a system designed for plasma etching of predetermined portions of material on multiple substrates. This system consists of several electrodes arranged parallel to one another, with hollow configurations featuring tapered apertures. A means for directing reactive gas through these apertures towards the substrates enhances the efficiency of the process. Additionally, the apparatus includes a first bus structure for electrical connection and grounding of the substrates, along with two more bus structures connected to radio frequency power sources that operate in a phased manner.

Another essential patent is the "Side Source Center Sink Plasma Reactor." This invention incorporates a plasma reactor chamber that facilitates continuous gas introduction, conversion of gas into reactive species via electrical fields, and the movement of substrates through the chamber. The automatic transport mechanism plays a vital role in advancing the substrates, while the vacuum lock maintains a stable atmosphere during substrate handling.

Career Highlights: Throughout his career, Neng-hsing Lu has worked with prestigious organizations such as the International Business Machines Corporation (IBM). His tenure at IBM has provided him a platform to apply his innovative thinking and engineering prowess in the realm of plasma technologies.

Collaborations: Neng-hsing Lu’s work has been enriched by collaborations with colleagues including Suryadevara Vijayakumar Babu and Carl-Otto Nilsen. These partnerships have fostered an environment of creativity and problem-solving, contributing to the advancements in plasma processing systems.

Conclusion: Neng-hsing Lu’s contributions to plasma processing highlight the importance of innovation in technological advancement. His patents reflect his commitment to improving existing systems and ushering in new methodologies that enhance productivity and efficiency. As he continues his work, Lu remains a noteworthy figure in the landscape of scientific invention and innovation.