Location History:
- San Francisco, CA (US) (1994)
- Foster City, CA (US) (1994 - 1997)
Company Filing History:
Years Active: 1994-1997
Title: Nelson N Tam: Innovator in Semiconductor Metrology
Introduction
Nelson N Tam is a prominent inventor based in Foster City, CA (US). He has made significant contributions to the field of semiconductor metrology, holding a total of 4 patents. His work focuses on precision determination of phase-shift in reticles, which are crucial for the fabrication of semiconductor devices.
Latest Patents
One of his latest patents is titled "Method and apparatus for precision determination of phase-shift in a metrology pattern on a reticle comprising a phase-shifted feature and an additional phase-shifted feature and/or non phase-shifted feature." This invention discloses a metrology pattern that can be used to determine the target thickness for achieving a 180-degree phase difference, which is essential for minimizing phase error on a phase-shifted reticle. The data generated from this method can help in understanding the correlation between focal shift, phase error, and shifter thickness.
Another notable patent is "Reticle with structurally identical inverted phase-shifted features." This patent describes a phase-shifted reticle with patterns that have inverted phases for the features and phase-shifting elements. The design ensures that any focal shift due to phase error is consistent across all patterns, maintaining an acceptable depth of field for substrates exposed with the reticle.
Career Highlights
Nelson N Tam is currently employed at Intel Corporation, where he continues to innovate in the semiconductor industry. His expertise in metrology and phase-shifting technology has positioned him as a key contributor to advancements in semiconductor fabrication processes.
Collaborations
Throughout his career, Nelson has collaborated with notable colleagues, including Giang T Dao and Eng T Gaw. These collaborations have further enhanced the impact of his inventions in the field.
Conclusion
Nelson N Tam's contributions to semiconductor metrology through his innovative patents demonstrate his commitment to advancing technology in this critical industry. His work not only improves the precision of semiconductor fabrication but also sets the stage for future innovations.