Holden, MA, United States of America

Neil N Ault

This inventor holds 1 USPTO granted patent. Top assignee: Norton Company. Active years: 1989.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Neil N Ault. Retrieved from https://idiyas.com/inventor/neil-n-ault

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 13(Granted Patents)


Company Filing History:


Years Active: 1989

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1 patent (USPTO):Explore Patents

Title: Neil N Ault: Innovator in Refractory Technology

Introduction

Neil N Ault is a notable inventor based in Holden, MA (US). He has made significant contributions to the field of refractory products, showcasing his expertise through his innovative patent.

Latest Patents

Ault holds a patent for a "Furnace having dense refractory oxide liner." This invention features a refractory product composed of a dense sintered alumina-chromia, zirconia-alumina-silica, zirconia-alumina body, or zirconia-chromia-alumina. The product is characterized by having less than about 8% of homogeneously distributed closed porosity, which is formed by sintering an intimate interdispersion of fine particles of alumina-chromia, zirconia-alumina-silica, zirconia-alumina, or zirconia-chromia-alumina. This innovation reflects Ault's commitment to advancing refractory technology.

Career Highlights

Neil N Ault is associated with Norton Company, where he has applied his skills and knowledge in the development of advanced materials. His work has contributed to the company's reputation for quality and innovation in the industry.

Collaborations

Ault has collaborated with notable colleagues, including Anthony K Butkus and Louis J Trostel, Jr. These partnerships have likely enhanced the development and implementation of innovative solutions in their field.

Conclusion

Neil N Ault is a distinguished inventor whose work in refractory technology has led to significant advancements. His patent and collaborations reflect his dedication to innovation and excellence in his field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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