Jamaica Plain, MA, United States of America

Neil H Judell


Average Co-Inventor Count = 2.6

ph-index = 3

Forward Citations = 95(Granted Patents)


Location History:

  • Plainfield, NJ (US) (1988)
  • Jamaica Plain, MA (US) (1989)

Company Filing History:


Years Active: 1988-1989

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3 patents (USPTO):Explore Patents

Title: Innovations of Neil H Judell

Introduction

Neil H Judell is a notable inventor based in Jamaica Plain, MA (US). He has made significant contributions to the field of semiconductor technology, holding a total of three patents. His work focuses on improving the precision and efficiency of wafer profiling and measurement systems.

Latest Patents

One of his latest patents is the "Wafer Flatness Station." This invention discloses an automatic wafer flatness station designed to obtain a flatness profile of a semiconductor wafer or other samples from thickness data. The sample is supported in a way that maintains its natural shape. A processor, coupled to a capacitive thickness sensing head, positions preselected points of the sample for measuring thickness. The data collected is stored in a data table, allowing the processor to compute the flatness profile relative to a selectable plane. This innovation is crucial for semiconductor processing, where surface flatness is essential.

Another significant patent is the "Improved Spatial Resolution Measurement System and Method." This invention provides a means and method for obtaining increased spatial resolution from a sensor. The probe used in this system has a characteristic physical dimension that limits its spatial resolution. By moving the probe and the object to be measured relative to each other, data is collected at increments that enhance the spatial resolution. This method is particularly useful in wafer profiling stations, where accurate thickness data is critical.

Career Highlights

Neil H Judell has had a successful career at Ade Corporation, where he has applied his expertise in semiconductor technology. His innovative patents have contributed to advancements in the industry, particularly in wafer measurement and profiling.

Collaborations

Throughout his career, Neil has collaborated with notable colleagues, including Noel S Poduje and Robert C Abbe. These collaborations have further enriched his work and contributed to the development of cutting-edge technologies in the semiconductor field.

Conclusion

Neil H Judell's contributions to semiconductor technology through his innovative patents have significantly impacted the industry. His work continues to influence advancements in wafer profiling and measurement systems.

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