Location History:
- Hedon, GB (1995)
- Hull, GB (1995)
Company Filing History:
Years Active: 1995
Title: Neil Bryan: Innovator in Ion Implantation Technology
Introduction
Neil Bryan is a notable inventor based in Hedon, GB. He has made significant contributions to the field of semiconductor technology, particularly in ion implantation. With a total of 2 patents, his work has advanced the capabilities of ion implanters used in the semiconductor industry.
Latest Patents
One of Neil Bryan's latest patents is focused on a spectrum analyzer in an ion implanter. This innovative ion implanter is designed for implanting ions into a semiconductor wafer. It comprises means for generating an ion beam and means for receiving charged particles ejected from the ion beam. The device includes first means for rejecting those of the received charged particles below a first predetermined energy and second means for rejecting those above a second predetermined energy, with the first predetermined energy being lower than the second. Additionally, the ion implanter features means to count the number of received charged particles between the first and second predetermined energies, along with scanning means for determining the energy at which the number of received charged particles is maximized.
Career Highlights
Neil Bryan is currently employed at Applied Materials, Inc., a leading company in the semiconductor equipment industry. His work at Applied Materials has allowed him to focus on developing advanced technologies that enhance the performance and efficiency of ion implantation processes.
Collaborations
Throughout his career, Neil has collaborated with several talented individuals, including David George Armour and Johnathan G England. These collaborations have contributed to the innovative advancements in the field of ion implantation technology.
Conclusion
Neil Bryan's contributions to ion implantation technology through his patents and work at Applied Materials, Inc. highlight his role as a key innovator in the semiconductor industry. His advancements continue to influence the development of more efficient and effective ion implanters.