Mountain View, CA, United States of America

Nehal Bengre Juraska

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Samsung Electronics Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Nehal Bengre Juraska. Retrieved from https://idiyas.com/inventor/nehal-bengre-juraska

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Nehal Bengre Juraska: Innovator in Natural Language Understanding

Introduction: Nehal Bengre Juraska is a prominent inventor based in Mountain View, CA. He has made significant contributions to the field of natural language understanding (NLU). His innovative work focuses on enhancing the capabilities of NLU models through advanced methodologies.

Latest Patents: Nehal holds a patent titled "Automatically Generating Annotated Ground-Truth Corpus for Training NLU Model." This patent represents a crucial advancement in the training of NLU systems, enabling more accurate and efficient model development. He has 1 patent to his name.

Career Highlights: Nehal is currently employed at Samsung Electronics Ltd., where he applies his expertise in artificial intelligence and machine learning. His role involves developing cutting-edge technologies that push the boundaries of what is possible in NLU.

Collaborations: Nehal has collaborated with talented individuals such as Jiun-Hao Jhan and Qingxiaoyang Zhu. These partnerships have fostered a creative environment that encourages innovation and the sharing of ideas.

Conclusion: Nehal Bengre Juraska is a key figure in the realm of natural language understanding, with a focus on improving NLU models through his patented work. His contributions continue to shape the future of artificial intelligence and its applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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