Company Filing History:
Years Active: 2002-2004
Title: Inventor Neal Robert Fornaciari: Pioneering Innovations in Extreme Ultraviolet Technologies
Introduction
Neal Robert Fornaciari, a prominent inventor based in Tracy, California, has made significant contributions to the field of extreme ultraviolet (EUV) technologies. With a total of three patents to his name, Fornaciari has focused on developing innovative solutions to enhance the efficiency and reliability of electric discharge plasma sources used in photolithography.
Latest Patents
Fornaciari's most recent patents address crucial challenges faced in the generation of extreme ultraviolet and soft x-ray radiation. One of his notable inventions is the "Discharge Source with Gas Curtain for Protecting Optics from Particles." This gas curtain device is designed to deflect debris generated by an EUV discharge source, projecting a stream of gas over the radiation path to direct debris particles away from optics, thus preventing their accumulation and potential damage.
Another significant patent is the "Electrode Configuration for Extreme-UV Electrical Discharge Source." This invention identifies ways to minimize debris generation within electric capillary discharge sources. By optimizing the magnitude and profile of the electric field across the electrodes, Fornaciari has developed a shape that facilitates uniform electric field strength, effectively reducing sputtering and debris generation.
Career Highlights
Neal Robert Fornaciari currently works at EUV LLC, where he continues to push the boundaries of technology related to extreme ultraviolet light sources. His expertise has positioned him as a key figure in the research and development of advanced photonics and electronic systems vital for the semiconductor industry.
Collaborations
Throughout his career, Fornaciari has collaborated with notable colleagues, including Michael P. Kanouff and Richard E. Nygren. Their combined expertise contributes to the innovative projects at EUV LLC, fostering an environment of creativity and technological advancement.
Conclusion
Neal Robert Fornaciari's work illustrates the impactful nature of innovation in the realm of extreme ultraviolet technologies. Through his patents and collaborations, he continues to address significant challenges in photolithography, paving the way for enhanced performance in the semiconductor industry. With his ongoing contributions, Fornaciari remains a vital player in the evolution of advanced optical technologies.