Neal B Gallagher

Title: The Innovative Contributions of Neal B Gallagher

Introduction

Neal B Gallagher is a notable inventor based in Manson, WA (US). He has made significant contributions to the field of etch processes through his innovative patent. His work focuses on enhancing the accuracy and efficiency of endpoint detection in these processes.

Latest Patents

Neal B Gallagher holds a patent titled "System and method for determining endpoint in etch processes using partial least squares discriminant analysis in the time domain of optical emission spectra." This invention is directed towards creating a predictive model for determining the endpoint of etch processes using Partial Least Squares Discriminant Analysis (PLS-DA). The method involves collecting calibration data from a calibration wafer using optical emission spectroscopy (OES) and processing this data to identify stable intensity values associated with etch and post-etch regions.

Career Highlights

Neal B Gallagher is currently associated with Verity Instruments, Inc., where he applies his expertise in optical emission spectroscopy and etch processes. His innovative approach has led to advancements in the field, particularly in the development of predictive models that enhance process control.

Collaborations

Neal has collaborated with notable colleagues, including Kenneth C Harvey and Jimmy W Hosch. These collaborations have contributed to the development and refinement of his innovative techniques in etch process analysis.

Conclusion

Neal B Gallagher's contributions to the field of etch processes through his innovative patent demonstrate his commitment to advancing technology in this area. His work continues to influence the industry and improve the efficiency of manufacturing processes.