Odawara, Japan

Natsuko Okiyama

This inventor holds 1 USPTO granted patent. Top assignee: Kao Corporation. Active years: 2022.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Natsuko Okiyama. Retrieved from https://idiyas.com/inventor/natsuko-okiyama

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 5(Granted Patents)


Company Filing History:


Years Active: 2022

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1 patent (USPTO):Explore Patents

Title: Natsuko Okiyama: Innovator in Skin Care Technology

Introduction

Natsuko Okiyama is a prominent inventor based in Odawara, Japan. She has made significant contributions to the field of skin care technology. With a focus on innovative solutions, Okiyama has developed products that enhance skin health and well-being.

Latest Patents

Okiyama holds a patent for a unique product known as the "Pad for Skin." This invention showcases her commitment to improving skin care through innovative design and functionality. Her patent reflects her expertise and dedication to advancing skin care technology.

Career Highlights

Okiyama is currently employed at Kao Corporation, a leading company in the personal care and cosmetics industry. Her work at Kao Corporation has allowed her to collaborate with other talented professionals and contribute to groundbreaking advancements in skin care.

Collaborations

Throughout her career, Okiyama has worked alongside notable colleagues, including Masayuki Uchiyama and Satoshi Ozawa. These collaborations have fostered a creative environment that encourages innovation and the development of new ideas.

Conclusion

Natsuko Okiyama is a trailblazer in the field of skin care technology, with her patent for the "Pad for Skin" exemplifying her innovative spirit. Her contributions to Kao Corporation and collaborations with esteemed colleagues highlight her impact on the industry. Okiyama's work continues to inspire advancements in skin care solutions.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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